Sample preparation, resist spinning, resist bake, developing, lift-off. Characterization using optical microscopy including differential interference contrast, stylus profilometry, plasma etching.

  • RIE Oxford Plasmalab 100, cryo, CF4, CHF3, SF6, Cl2, Ar, O2, He-backside cooling, Laser Endpoint Detection
  • RIE Oxford Plasmalab 80+, Ar, O2, with ICP 85 
  • Stylus Profilometer KLA Tencor P7 
  • EMS 4000 Spin Coater 
  • EMS 6000 Spin Coater
  • Schaefer Tec SCE-15 Spin Coater 
  • EMS Hotplate 
  • Nikon ME600 Optical microscope, DIC, DF, 3 Mpix camera 
  • Nikon ME600 Optical Microscope, DIC, DF, 5 Mpix camera 
  • Nikon Stereo Microscope
  • Millipore MilliQ Reference Clean Water System