Sample preparation, resist spinning, resist bake, developing, lift-off. Characterization using optical microscopy including differential interference contrast, stylus profilometry, plasma etching.
- RIE Oxford Plasmalab 100, cryo, CF4, CHF3, SF6, Cl2, Ar, O2, He-backside cooling, Laser Endpoint Detection
- RIE Oxford PlasmaPro 100 Cobra 300 ICP , cryo, Bosch process, installation during fall 2021
- RIE Oxford Plasmalab 80+, Ar, O2, with ICP 85
- Stylus Profilometer KLA Tencor P7
- EMS 4000 Spin Coater
- EMS 6000 Spin Coater
- Schaefer Tec SCE-15 Spin Coater
- EMS Hotplate
- Nikon ME600 Optical microscope, DIC, DF, 3 Mpix camera
- Nikon ME600 Optical Microscope, DIC, DF, 5 Mpix camera
- Nikon Stereo Microscope
- Millipore MilliQ Reference Clean Water System