We emphasize direct-writing methods for patterning, especially E-beam and Focused-ion-beam lithography (EBL&FIB), but also direct-write photo-lithography, as opposed to mask-based lithography. This saves time and money with our small-series nano-device research and small-series prototyping.
Our specialty are films and multilayers by sputtering and evaporation. We work with a wide variety of materials, with cross-usage requirements that are not as stringent as in many specialized-process labs. Our proof-of-concept environment is ideally suited to academic research as well as various startups and spinoffs in the nano-tech area.
Our users have access to various etching systems capable of sample cryo-cooling; processes based on various resists, surface profilometers, optical microscopes, ovens, chip bonders, probe stations, and various other tools. Additionally, we offer a versatile lineup of AFM microscopes and an EDX system for chemical analysis.